- Patent Title: Atomic layer deposition of metal phosphates and lithium silicates
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Application No.: US15073275Application Date: 2016-03-17
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Publication No.: US09765431B2Publication Date: 2017-09-19
- Inventor: Jani Hamalainen , Jani Holopainen , Timo Hatanpaa , Mikko Ritala , Markku Leskela
- Applicant: ASM IP HOLDING B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP HOLDING B.V.
- Current Assignee: ASM IP HOLDING B.V.
- Current Assignee Address: NL Almere
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/08 ; C23C16/18 ; C23C16/30 ; C23C16/50 ; C23C16/40
Abstract:
The present application relates to atomic layer deposition (ALD) processes for producing metal phosphates such as titanium phosphate, aluminum phosphate and lithium phosphate, as well as to ALD processes for depositing lithium silicates.
Public/Granted literature
- US20160265110A1 ATOMIC LAYER DEPOSITION OF METAL PHOSPHATES AND LITHIUM SILICATES Public/Granted day:2016-09-15
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