Invention Grant
- Patent Title: Dual-direction chemical delivery system for ALD/CVD chambers
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Application No.: US15152731Application Date: 2016-05-12
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Publication No.: US09765432B2Publication Date: 2017-09-19
- Inventor: Zhenbin Ge , Chien-Teh Kao , Joel M. Huston , Mei Chang
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Sevilla Whitney LLC
- Main IPC: C23C16/455
- IPC: C23C16/455 ; B08B9/032 ; C23C16/44 ; C23C14/22 ; C23C16/52

Abstract:
Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
Public/Granted literature
- US20160273108A1 Dual-Direction Chemical Delivery System For ALD/CVD Chambers Public/Granted day:2016-09-22
Information query
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