Invention Grant
- Patent Title: Electrolyte for surface treatment of metal implant and method for surface treatment of metal implant using said electrolyte
-
Application No.: US14967424Application Date: 2015-12-14
-
Publication No.: US09765442B2Publication Date: 2017-09-19
- Inventor: Li-Wen Weng , Chun-Chieh Tseng , Yue-Jun Wang , Ho-Chung Fu , Tzyy-Ker Sue
- Applicant: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE
- Applicant Address: TW Kaohsiung
- Assignee: Metal Industries Research & Development Centre
- Current Assignee: Metal Industries Research & Development Centre
- Current Assignee Address: TW Kaohsiung
- Agency: Kamrath IP Lawfirm, P.A.
- Agent Alan D. Kamrath
- Main IPC: C25D11/08
- IPC: C25D11/08 ; C25D11/16 ; C25D11/24

Abstract:
An electrolyte for surface treatment of a metal implant includes 10-30 wt % of a sulfur-containing compound aqueous solution, 3-10 wt % of a phosphorous-containing compound aqueous solution, 0.5-2 wt % of an oxidant aqueous solution, and 0.5-5 wt % of a surfactant aqueous solution, with the rest being water. The concentration of the sulfur-containing compound aqueous solution is 0.1-3 M. The concentration of the phosphorous-containing compound aqueous solution is 0.05-2 M. The concentration of the oxidant aqueous solution is 0.05-1 M. The concentration of the surfactant aqueous solution is 0.05-5 M. The electrolyte is utilized for treating a surface of a metal implant, forming a porous oxide layer on the surface of the metal implant.
Public/Granted literature
Information query