Invention Grant
- Patent Title: Multi field point aberration parallel metrology device and method for lithographic projection lens
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Application No.: US14984577Application Date: 2015-12-30
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Publication No.: US09766154B2Publication Date: 2017-09-19
- Inventor: Fengzhao Dai , Xiangzhao Wang , Feng Tang , Yazhong Zheng
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN201510757427 20151109
- Main IPC: G01M11/02
- IPC: G01M11/02 ; G03F7/20

Abstract:
A multi field point aberration parallel detection device for a lithographic projection lens and a detection method therefor, having a spatial light modulator that is respectively arranged on the object plane and the image plane of the projection lens under test, wherein the object plane spatial light modulator and the image plane spatial light modulator are respectively disposed as an object plane grating set comprising multiple one-dimensional gratings and an image plane grating set comprising multiple two-dimensional gratings via computer programming. The gratings in the object plane grating set and the image plane grating set are conjugate one to another in respect of the projection lens under test, with each pair of conjugate grating being measured for the wave aberration of a field point.
Public/Granted literature
- US20170131176A1 MULTI FIELD POINT ABERRATION PARALLEL METROLOGY DEVICE AND METHOD FOR LITHOGRAPHIC PROJECTION LENS Public/Granted day:2017-05-11
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