Invention Grant
- Patent Title: Liquid treatment method, substrate processing apparatus and non-transitory storage medium
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Application No.: US14621522Application Date: 2015-02-13
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Publication No.: US09766543B2Publication Date: 2017-09-19
- Inventor: Yuichiro Kunugimoto , Izumi Hasegawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2014-026407 20140214
- Main IPC: B05C11/00
- IPC: B05C11/00 ; B05C11/02 ; G03B27/32 ; G03B27/52 ; G03F7/16 ; H01L21/67 ; G03F7/30 ; H01L21/66

Abstract:
In one embodiment, a liquid treatment method includes (A) imaging a discharging port part of the liquid nozzle each time the discharging process is performed to one substrate, and acquiring, from images thus obtained, size data on foreign matter possibly present at the discharging port part; and (B) based on a history of the size data arranged in chronological order, judging whether an abnormality in substrate-processing has occurred. In the item (B), if the number of continuous acquisition, indicating how many times the size data not smaller than a first threshold value has been acquired continuously, exceeds a predetermined value, then judging that an abnormality in substrate-processing has occurred.
Public/Granted literature
- US20150234277A1 LIQUID TREATMENT METHOD, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY STORAGE MEDIUM Public/Granted day:2015-08-20
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