Invention Grant
- Patent Title: Application of powered electrostatic faraday shield to recondition dielectric window in ICP plasmas
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Application No.: US14832901Application Date: 2015-08-21
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Publication No.: US09767996B2Publication Date: 2017-09-19
- Inventor: Robert G. O'Neill , Neil M. P. Benjamin , Jie Zhang
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- Main IPC: H01L21/306
- IPC: H01L21/306 ; H01J37/32

Abstract:
Disclosed herein are various embodiments, including an electrostatic screen for use in a plasma processing chamber with a plurality of electrical leads. A plurality of petal groups is provided with each petal group comprising a substantially-flat structure, wherein each petal group is electrically connected to at least one electrical lead of the plurality of electrical leads and wherein each petal group is insulated from any other petal group, wherein the plurality of petal groups form a radial symmetry around a vertical axis. Each substantially flat structure comprises a sector of a conductive annulus and a plurality of conductive petals, each connected to the sector of the conductive annulus, wherein the at least one electrical lead is connected to substantially equal potential locations in each petal group.
Public/Granted literature
- US20170053782A1 APPLICATION OF POWERED ELECTROSTATIC FARADAY SHIELD TO RECONDITION DIELECTRIC WINDOW IN ICP PLASMAS Public/Granted day:2017-02-23
Information query
IPC分类: