Invention Grant
- Patent Title: Optoelectronic semiconductor device with barrier layer
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Application No.: US14475210Application Date: 2014-09-02
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Publication No.: US09768351B2Publication Date: 2017-09-19
- Inventor: Tsung-Hsien Liu , Rong-Ren Lee , Shih-Chang Lee
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW102131493A 20130830
- Main IPC: H01L33/30
- IPC: H01L33/30 ; H01L33/08 ; H01L33/06 ; H01L33/02 ; H01L33/04

Abstract:
An optoelectronic semiconductor device comprises a barrier layer, a first semiconductor layer on the barrier layer, the first semiconductor layer comprising a first dopant and a second dopant, and a second semiconductor layer beneath the barrier layer, the second semiconductor comprising the second dopant, wherein, in the first semiconductor layer, a concentration of the first dopant is larger than a concentration of the second dopant, and the concentration of the second dopant in the second semiconductor layer is larger than that in the first semiconductor layer.
Public/Granted literature
- US20150060877A1 OPTOELECTRONIC SEMICONDUCTOR DEVICE WITH BARRIER LAYER Public/Granted day:2015-03-05
Information query
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