Invention Grant
- Patent Title: Salt, acid generator, resist composition and method for producing resist pattern
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Application No.: US14968172Application Date: 2015-12-14
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Publication No.: US09771346B2Publication Date: 2017-09-26
- Inventor: Takayuki Miyagawa , Yukako Anryu , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-252628 20141215
- Main IPC: C07D327/06
- IPC: C07D327/06 ; C07D327/02 ; C07D327/04 ; C07D321/04 ; C07D321/12 ; C07D313/06 ; C07D317/72 ; G03F7/004 ; G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/32 ; G03F7/38 ; G03F7/16 ; C07C309/12 ; C07C309/06

Abstract:
A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.
Public/Granted literature
- US20160168115A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-06-16
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