Invention Grant
- Patent Title: Cleaning formulation for removing residues on surfaces
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Application No.: US14564566Application Date: 2014-12-09
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Publication No.: US09771550B2Publication Date: 2017-09-26
- Inventor: Emil A. Kneer
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/70
- IPC: H01L21/70 ; C11D11/00 ; C11D7/10 ; C11D7/08 ; H01L21/02 ; H01L21/3065 ; C11D3/00
Abstract:
This disclosure relates to a cleaning composition that contains 1) HF; 2) substituted or unsubstituted boric acid; 3) ammonium sulfate; 4) at least one metal corrosion inhibitor; 5) water; and 6) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
Public/Granted literature
- US20150159125A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES Public/Granted day:2015-06-11
Information query
IPC分类:
