Invention Grant
- Patent Title: Process for forming graphene layers on silicon carbide
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Application No.: US15022532Application Date: 2014-09-08
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Publication No.: US09771665B2Publication Date: 2017-09-26
- Inventor: Francesca Iacopi , Mohsin Ahmed , Benjamin Vaughan Cunning
- Applicant: Griffith University
- Applicant Address: AU Nathan, Queensland
- Assignee: GRIFFITH UNIVERSITY
- Current Assignee: GRIFFITH UNIVERSITY
- Current Assignee Address: AU Nathan, Queensland
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: AU2013903547 20130916; AU2014902792 20140718
- International Application: PCT/AU2014/050218 WO 20140908
- International Announcement: WO2015/035465 WO 20150319
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C30B1/02 ; C30B1/10 ; C30B29/02 ; C01B31/04 ; B81C1/00 ; H01L21/02

Abstract:
A process for forming graphene, includes: depositing at least a first and a second metal onto a surface of silicon carbide (SiC), and heating the SiC and the first and second metals under conditions that cause the first metal to react with silicon of the silicon carbide to form carbon and at least one stable silicide. The corresponding solubilities of the carbon in the stable silicide and in the second metal are sufficiently low that the carbon produced by the silicide reaction forms a graphene layer on the SiC.
Public/Granted literature
- US20160230304A1 PROCESS FOR FORMING GRAPHENE LAYERS ON SILICON CARBIDE Public/Granted day:2016-08-11
Information query
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