Invention Grant
- Patent Title: Defect reduction in seeded aluminum nitride crystal growth
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Application No.: US14684754Application Date: 2015-04-13
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Publication No.: US09771666B2Publication Date: 2017-09-26
- Inventor: Robert T. Bondokov , Leo J. Schowalter , Kenneth Morgan , Glen A. Slack , Shailaja P. Rao , Shawn Robert Gibb
- Applicant: Crystal IS, Inc.
- Applicant Address: US NY Green Island
- Assignee: CRYSTAL IS, INC.
- Current Assignee: CRYSTAL IS, INC.
- Current Assignee Address: US NY Green Island
- Agency: Morgan, Lewis & Bockius LLP
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B23/02 ; C30B29/40

Abstract:
Bulk single crystal of aluminum nitride (AlN) having an areal planar defect density≦100 cm−2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum, the foundation forming a portion of an AlN seed holder, for an AlN seed to be used for the AlN growth. The holder may consist essentially of a substantially impervious backing plate.
Public/Granted literature
- US20150275393A1 DEFECT REDUCTION IN SEEDED ALUMINUM NITRIDE CRYSTAL GROWTH Public/Granted day:2015-10-01
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