Invention Grant
- Patent Title: Control apparatus, substrate processing apparatus, and substrate processing system
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Application No.: US14645613Application Date: 2015-03-12
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Publication No.: US09772624B2Publication Date: 2017-09-26
- Inventor: Yuichi Takenaga , Takanori Saito
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2014-050318 20140313
- Main IPC: G05B19/418
- IPC: G05B19/418 ; H01L21/67
Abstract:
A control apparatus is configured to control an operation of a substrate processing apparatus configured to place at least a monitor substrate therein. The control apparatus controls the operation of the substrate processing apparatus based on a difference between a processing result of the monitor substrate processed by the substrate processing apparatus and a predictive result so as to optimize the monitor substrate loading frequency.
Public/Granted literature
- US20150261212A1 CONTROL APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2015-09-17
Information query
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