Invention Grant
- Patent Title: Imprint pattern guided self-assembly of lamellar block copolymer for BPM
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Application No.: US14158611Application Date: 2014-01-17
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Publication No.: US09773520B2Publication Date: 2017-09-26
- Inventor: XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , HongYing Wang , Kim Y. Lee
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/28 ; G11B5/855 ; G03F7/00
Abstract:
The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
Public/Granted literature
- US20150206548A1 IMPRINT PATTERN GUIDED SELF-ASSEMBLY OF LAMELLAR BLOCK COPOLYMER FOR BPM Public/Granted day:2015-07-23
Information query
IPC分类:
