Invention Grant
- Patent Title: Radiation source-collector and method for manufacture
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Application No.: US14765367Application Date: 2014-01-14
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Publication No.: US09773578B2Publication Date: 2017-09-26
- Inventor: Alexey Sergeevich Kuznetsov , Arjen Boogaard , Jeroen Marcel Huijbregtse , Andrey Nikipelov , Maarten Van Kampen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2014/050552 WO 20140114
- International Announcement: WO2014/124769 WO 20140821
- Main IPC: G21K1/06
- IPC: G21K1/06 ; G03F7/20 ; H05G2/00 ; B82Y10/00 ; C23C28/00 ; G03F1/24
Abstract:
A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
Public/Granted literature
- US20160012929A1 Radiation Source-Collector and Method for Manufacture Public/Granted day:2016-01-14
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