- Patent Title: Magnetoresistive memory device and manufacturing method of the same
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Application No.: US14643657Application Date: 2015-03-10
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Publication No.: US09773838B2Publication Date: 2017-09-26
- Inventor: Satoshi Inaba
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz & Volek PC
- Main IPC: H01L27/10
- IPC: H01L27/10 ; H01L27/22 ; H01L29/78 ; H01L43/12 ; H01L29/66

Abstract:
According to one embodiment, there is provided a magnetoresistive memory device. The memory device includes active areas arranged on a semiconductor substrate, resistance change elements arrayed to matrix in an X direction and a Y direction above the substrate, and selective transistors provided to correspond to the respective resistance change elements. A plurality of gate electrodes of the selective transistors are spaced apart at regular intervals in the X direction and arranged along the Y direction. Each of the active areas is provided to cross two of the gate electrodes adjacent to each other, such as to be along the X direction at a portion crossing the gate electrodes, and formed to be inclined with respect to the X direction between the adjacent gate electrodes.
Public/Granted literature
- US20160071907A1 MAGNETORESISTIVE MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2016-03-10
Information query
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