Invention Grant
- Patent Title: Low pressure polishing method and apparatus
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Application No.: US14788823Application Date: 2015-07-01
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Publication No.: US09776305B2Publication Date: 2017-10-03
- Inventor: Simon Palushaj
- Applicant: Diamabrush LLC
- Applicant Address: US MI Madison Heights
- Assignee: Diamabrush LLC
- Current Assignee: Diamabrush LLC
- Current Assignee Address: US MI Madison Heights
- Agency: Bejin Bieneman PLC
- Main IPC: B24D11/00
- IPC: B24D11/00 ; A46B13/00 ; A46B13/02 ; B24B7/18 ; B24D13/16 ; B24B1/00

Abstract:
A low pressure, low speed concrete polishing apparatus and method of cleaning and polishing a floor a polishing pad and interchangeable polymer strips. The interchangeable polymer strips are slideably received within the housing of the pad. The polymer strips have an abrasive material embedded therein which collectively work to polish the floor while cleaning the floor during normal speed floor cleaning conditions.
Public/Granted literature
- US20150306738A1 LOW PRESSURE POLISHING METHOD AND APPARATUS Public/Granted day:2015-10-29
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