- Patent Title: Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby
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Application No.: US13261951Application Date: 2013-03-08
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Publication No.: US09776914B2Publication Date: 2017-10-03
- Inventor: Yu Wang , Srikanth Varanasi , David Alan Strickler
- Applicant: PILKINGTON GROUP LIMITED
- Applicant Address: GB Lathom
- Assignee: Pilkington Group Limited
- Current Assignee: Pilkington Group Limited
- Current Assignee Address: GB Lathom
- Agency: Marshall & Melhorn, LLC
- International Application: PCT/GB2013/050585 WO 20130308
- International Announcement: WO2013/136052 WO 20130919
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C03C17/34 ; C23C16/40 ; C23C16/455 ; C23C16/54 ; C03C17/245

Abstract:
A CVD process for depositing a zinc oxide coating is provided. The CVD process includes providing a moving glass substrate. The CVD process also includes forming a gaseous mixture of an alkyl zinc compound and an inert gas as a first stream, providing a first gaseous inorganic oxygen-containing compound in a second stream and providing a second gaseous inorganic oxygen-containing compound in the second stream, a third stream or in both the second and third streams. Additionally, the CVD process includes mixing the streams at or near a surface of the moving glass substrate and a zinc oxide coating is formed thereon. A method for forming a coated glass article is also provided. Additionally, a coated glass article is provided.
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