Invention Grant
- Patent Title: Modified novolak phenolic resin, making method, and resist composition
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Application No.: US14560358Application Date: 2014-12-04
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Publication No.: US09777102B2Publication Date: 2017-10-03
- Inventor: Yoshinori Hirano , Hideyoshi Yanagisawa
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-233901 20111025; JP2012-176987 20120809
- Main IPC: G03F7/023
- IPC: G03F7/023 ; C08G8/28 ; C08G14/10 ; G03F7/038 ; G03F7/022 ; C08G8/00 ; C08L61/00 ; C08L61/04 ; C08L61/20
Abstract:
A modified novolak phenolic resin is obtained by reacting a novolak phenolic resin containing at least 50 wt % of p-cresol with a crosslinker. This method increases the molecular weight of the existing novolak phenolic resin containing at least 50 wt % of p-cresol to such a level that the resulting modified novolak phenolic resin has heat resistance enough for the photoresist application.
Public/Granted literature
- US20150087792A1 MODIFIED NOVOLAK PHENOLIC RESIN, MAKING METHOD, AND RESIST COMPOSITION Public/Granted day:2015-03-26
Information query
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