Invention Grant
- Patent Title: Xylylenediamine composition and method for producing polyamide resin
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Application No.: US15032031Application Date: 2014-10-29
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Publication No.: US09777115B2Publication Date: 2017-10-03
- Inventor: Takashi Nakamura , Hajime Yamada , Tatsuya Tochihara , Katsumi Shinohara , Jun Mitadera , Takashi Yamamoto
- Applicant: Mitsubishi Gas Chemical Company, Inc.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2013-227261 20131031; JP2013-227262 20131031
- International Application: PCT/JP2014/078735 WO 20141029
- International Announcement: WO2015/064627 WO 20150507
- Main IPC: C08G69/26
- IPC: C08G69/26 ; C08G69/28 ; C08G69/30

Abstract:
Provided are [1] a xylylenediamine composition containing xylylenediamine and a pyridine compound (A) having at least one substituent including an amino group, wherein the content of the pyridine compound (A) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a pyridine compound (A) having at least one substituent including an amino group, a diamine including xylylenediamine (but excluding a diamine corresponding to the above-mentioned pyridine compound (A)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the pyridine compound (A) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of xylylenediamine.
Public/Granted literature
- US20160304670A1 XYLYLENEDIAMINE COMPOSITION AND METHOD FOR PRODUCING POLYAMIDE RESIN Public/Granted day:2016-10-20
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