Invention Grant
- Patent Title: Method for producing a single-crystalline layer
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Application No.: US14415980Application Date: 2013-07-15
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Publication No.: US09777393B2Publication Date: 2017-10-03
- Inventor: Lamine Benaissa
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Oliff PLC
- Priority: FR1256898 20120717
- International Application: PCT/FR2013/051688 WO 20130715
- International Announcement: WO2014/013173 WO 20140123
- Main IPC: C30B13/00
- IPC: C30B13/00 ; H01L21/02 ; C30B13/24

Abstract:
Process for fabricating a thin single-crystalline layer n, including steps of: a) providing a support substrate n, b) placing a seed sample n, c) depositing a thin layer n so as to form an initial interface region n including a proportion of seed sample n and a proportion of thin layer n, the proportion of seed sample n decreasing from the first peripheral part n towards the second peripheral part n, e) providing an energy input to the initial interface region n contiguous to the first peripheral part n so as to liquefy a portion n of the thin layer and form a solid/liquid interface region n, and f) gradually moving the energy input away from the seed sample n so as to solidify the portion n so as to gradually move the solid/liquid interface region n.
Public/Granted literature
- US20150191847A1 METHOD FOR PRODUCING A SINGLE-CRYSTALLINE LAYER Public/Granted day:2015-07-09
Information query
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