Invention Grant
- Patent Title: Imprint material
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Application No.: US14784400Application Date: 2014-03-28
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Publication No.: US09778564B2Publication Date: 2017-10-03
- Inventor: Junpei Kobayashi , Taku Kato , Masayoshi Suzuki
- Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-087545 20130418; JP2013-125807 20130614
- International Application: PCT/JP2014/059205 WO 20140328
- International Announcement: WO2014/171302 WO 20141023
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/00 ; G03F7/028 ; H01L21/768 ; G03F7/027 ; C08F2/48 ; C08F220/56 ; C08L33/14 ; C09D4/00 ; C08F220/32

Abstract:
There is provided an imprint material that has sufficient adhesion to film substrates and excellent scratch resistance, and can be readily released from a mold at the time of mold release. An imprint material including: (A) a specific acrylamide such as N,N′-dimethylacrylamide; (B) a compound having alkylene oxide units and having 2 to 6 polymerizable groups at the ends of the compound, in which the alkylene oxide units are ethylene oxide units, propylene oxide units, or a combination thereof; and (C) a photopolymerization initiator.
Public/Granted literature
- US20160068674A1 IMPRINT MATERIAL Public/Granted day:2016-03-10
Information query
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