Invention Grant
- Patent Title: Microlithography illumination system and microlithography illumination optical unit
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Application No.: US15046743Application Date: 2016-02-18
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Publication No.: US09778576B2Publication Date: 2017-10-03
- Inventor: Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102008002749 20080627
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
Public/Granted literature
- US20160195820A1 MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT Public/Granted day:2016-07-07
Information query
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