Invention Grant
- Patent Title: Low contact imprint lithography template chuck system for improved overlay correction
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Application No.: US14536069Application Date: 2014-11-07
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Publication No.: US09778578B2Publication Date: 2017-10-03
- Inventor: Mario Johannes Meissl , Anshuman Cherala , Byung-Jin Choi , Seth J. Bamesberger
- Applicant: Canon Nanotechnologies, Inc. , Toshiba Corporation
- Applicant Address: US TX Austin
- Assignee: Canon Nanotechnologies, Inc.
- Current Assignee: Canon Nanotechnologies, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: G03B27/60
- IPC: G03B27/60 ; G03F7/20 ; G03F7/00
Abstract:
Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
Public/Granted literature
- US20150131072A1 LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION Public/Granted day:2015-05-14
Information query
