Invention Grant
- Patent Title: Metal oxide thin film, method of producing same, and coating solution for forming metal oxide thin film used in said method
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Application No.: US14989059Application Date: 2016-01-06
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Publication No.: US09779938B2Publication Date: 2017-10-03
- Inventor: Masahiro Takata , Makoto Kikuchi , Atsushi Tanaka , Masayuki Suzuki
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-144296 20130710
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/66 ; H01L29/786 ; H01L29/24 ; G02F1/1368
Abstract:
A metal oxide thin film according to the present invention has a peak which is attributed to 1s electrons of nitrogen in a binding energy range of 402 eV to 405 eV in an XPS spectrum obtained by X-ray photoelectron spectroscopy, in which peak areas, which are obtained by separation of peaks having a peak energy of a metal-oxygen bond attributed to 1s electrons of oxygen, satisfy the following expression. 0.9
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