Invention Grant
- Patent Title: Method of, and apparatus for, forming hard mask
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Application No.: US14560659Application Date: 2014-12-04
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Publication No.: US09779958B2Publication Date: 2017-10-03
- Inventor: Katsuaki Nakano
- Applicant: ULVAC, INC.
- Applicant Address: JP Chigasaki-shi
- Assignee: ULVAC, Inc.
- Current Assignee: ULVAC, Inc.
- Current Assignee Address: JP Chigasaki-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2014-025899 20140213
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/308 ; C23C14/06 ; C23C14/58 ; H01L21/311 ; H01L21/3205 ; H01L21/321
Abstract:
A method of forming a hard mask includes depositing step for depositing a titanium nitride film on a surface of a to-be-processed object; adsorbing step for adsorbing oxygen-containing molecules onto a surface of the titanium nitride film; and heating step for heating the titanium nitride film to a predetermined temperature.
Public/Granted literature
- US20150228496A1 METHOD OF, AND APPARATUS FOR, FORMING HARD MASK Public/Granted day:2015-08-13
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