Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14239810Application Date: 2012-08-21
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Publication No.: US09780738B2Publication Date: 2017-10-03
- Inventor: Kazuki Ota
- Applicant: Kazuki Ota
- Applicant Address: JP Koutou-ku, Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Koutou-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-180163 20110822
- International Application: PCT/JP2012/071058 WO 20120821
- International Announcement: WO2013/027722 WO 20130228
- Main IPC: H03F3/16
- IPC: H03F3/16 ; H01L29/40 ; H01L29/778 ; H01L29/20

Abstract:
A semiconductor device is provided with: a field-effect transistor that has a source electrode and a drain electrode that are connected to a semiconductor layer, a gate electrode that is provided on the surface of the semiconductor layer between the source electrode and the drain electrode, and a field plate electrode that is provided on the surface of the semiconductor layer in the vicinity of the gate electrode via an insulating layer, wherein the field-effect transistor amplifies high frequency signals received by the gate electrode to be outputted from the drain electrode; and a voltage dividing circuit that divides a potential difference between the drain electrode and a reference potential GND, and applies a bias voltage such that respective parts of the field plate electrode have a mutually equal potential.
Public/Granted literature
- US20140203877A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-07-24
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