Invention Grant
- Patent Title: Phenyl (meth)acrylate production method and phenyl (meth)acrylate composition
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Application No.: US15284750Application Date: 2016-10-04
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Publication No.: US09783480B2Publication Date: 2017-10-10
- Inventor: Ryo Aizawa , Takeshi Matsuo , Naoshi Murata , Hiroyuki Mori
- Applicant: Mitsubishi Chemical Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Chemical Corporation
- Current Assignee: Mitsubishi Chemical Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-225352 20131030
- Main IPC: C07C67/11
- IPC: C07C67/11 ; C07C57/62 ; C07C67/10 ; C07C57/42 ; C07C67/62
Abstract:
Provided is a method that can produce phenyl(meth)acrylate inexpensively and at high yields. The phenyl(meth)acrylate production method of the present invention reacts (meth)acrylic acid with carbonic acid diphenyl. Further, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10% carbonic acid diphenyl. Or, the phenyl(meth)acrylate composition of the present invention contains 90-99.999 wt % phenyl(meth)acrylate and 0.001-10 wt % of a specified compound.
Public/Granted literature
- US20170022136A1 PHENYL (METH)ACRYLATE PRODUCTION METHOD AND PHENYL (METH)ACRYLATE COMPOSITION Public/Granted day:2017-01-26
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