Invention Grant
- Patent Title: Silicon single crystal growing apparatus and method for growing silicon single crystal
-
Application No.: US14425394Application Date: 2013-08-26
-
Publication No.: US09783912B2Publication Date: 2017-10-10
- Inventor: Ryoji Hoshi , Kosei Sugawara
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-221472 20121003
- International Application: PCT/JP2013/005009 WO 20130826
- International Announcement: WO2014/054214 WO 20140410
- Main IPC: C30B15/06
- IPC: C30B15/06 ; C30B15/14 ; C30B29/06 ; C30B15/12

Abstract:
A silicon single crystal growing apparatus based on a Czochralski method arranges a graphite crucible inside a graphite heater for heating and a quartz crucible inside the graphite crucible and grows a crystal from a raw material melt filling the quartz crucible, and includes a heater outer heat-insulating member outside the graphite heater, a crucible lower heat-insulating member below the graphite crucible, a crucible upper heat-insulating member above straight bodies of the graphite and quartz crucibles, a crucible outer heat-insulating member outside the straight body of the graphite crucible, a crucible inner heat-insulating member inside the straight bodies of the graphite crucible and the quartz crucible, and a heat shielding member above a liquid surface of the raw material melt, the graphite crucible and the quartz crucible being movable upward and downward in a space enclosed with the crucible upper heat-insulating, crucible outer heat-insulating, and crucible inner heat-insulating members.
Public/Granted literature
- US20150240379A1 SILICON SINGLE CRYSTAL GROWING APPARATUS AND METHOD FOR GROWING SILICON SINGLE CRYSTAL Public/Granted day:2015-08-27
Information query
IPC分类: