Invention Grant
- Patent Title: Array substrate structure and manufacturing method thereof
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Application No.: US14764176Application Date: 2015-05-25
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Publication No.: US09785023B2Publication Date: 2017-10-10
- Inventor: Xiaojiang Yu , Haibo Du
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd. , Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong CN Wuhan, Hubei
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.,WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.,WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen, Guangdong CN Wuhan, Hubei
- Agent Leong C. Lei
- Priority: CN201510233736 20150508
- International Application: PCT/CN2015/079661 WO 20150525
- International Announcement: WO2016/179853 WO 20161117
- Main IPC: G02F1/1343
- IPC: G02F1/1343 ; H01L27/12 ; G02F1/1368 ; G02F1/1362 ; G02F1/1333

Abstract:
The present invention provides an array substrate structure and a manufacturing method thereof, in which after a common electrode (91) is formed, a reduction resistant layer (82) is first formed on the common electrode (91) before deposition of a second insulation layer (83) in order to prevent the film quality of the common electrode (91) from being affected by a reductive atmosphere generated in a process of directly depositing the second insulation layer (83) on the common electrode (91) thereby reducing the influence on the transmittal of the common electrode (91) caused by the deposition of the second insulation layer (83) on the common electrode (91) and providing the common electrode (91) with increased transmittal and enhancing displaying performance.
Public/Granted literature
- US20170139256A1 ARRAY SUBSTRATE STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2017-05-18
Information query
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