Invention Grant
- Patent Title: Resist composition
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Application No.: US14895634Application Date: 2014-05-28
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Publication No.: US09785048B2Publication Date: 2017-10-10
- Inventor: Masaaki Takasuka , Masatoshi Echigo , Yu Okada , Yumi Ochiai
- Applicant: Mitsubishi Gas Chemical Company, Inc.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2013-121183 20130607
- International Application: PCT/JP2014/064083 WO 20140528
- International Announcement: WO2014/196425 WO 20141211
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; G03F7/038 ; G03F7/039

Abstract:
The resist composition according to the present invention is a resist composition comprising a solid component comprising a resist base material, and a solvent. In the resist composition according to the present invention, the resist composition contains 1 to 80% by mass of the solid component and 20 to 99% by mass of the solvent, the resist base material comprises a compound (ctt form) represented by a predetermined formula (1) and a compound represented by a predetermined formula (3), the proportion of the compound (ctt form) represented by the predetermined formula (1) to the resist base material is from 65 to 99% by mass, and the mass ratio of the compound represented by the predetermined formula (3) to the compound (ctt form) represented by the predetermined formula (1) is from 0.01 to 0.53.
Public/Granted literature
- US09746769B2 Resist composition Public/Granted day:2017-08-29
Information query
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