Invention Grant
- Patent Title: Parallel multi wafer axial spin clean processing using spin cassette inside movable process chamber
-
Application No.: US14754364Application Date: 2015-06-29
-
Publication No.: US09786486B2Publication Date: 2017-10-10
- Inventor: Amuldeep S. Brar , Nampyo Lee , Woosung Han
- Applicant: Samsung Electronics Co., Ltd , Samsung Austin Semiconductor, L.L.C.
- Applicant Address: KR Suwon-si US TX Austin
- Assignee: Samsung Electronics Co., Ltd.,Samsung Austin Semiconductor, LP
- Current Assignee: Samsung Electronics Co., Ltd.,Samsung Austin Semiconductor, LP
- Current Assignee Address: KR Suwon-si US TX Austin
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/687 ; H01L21/67 ; H01L21/673 ; H01L21/677
Abstract:
A system and method concurrently processes multiple wafers. A cassette structure includes multiple chucks and a drive spool for supporting and rotating the chucks. Each chuck holds a wafer in position while rotating. The cassette structure is loaded into a process chamber. Each chuck includes a self-locking mechanism that is activated by the centrifugal force generated from the rotation of the chuck. The self-locking mechanism centers and holds a wafer in position with respect to the chuck. A drive motor drives the drive spool, which causes the chucks to rotate. As the chucks are being rotated, a dispensing assembly delivers a processing chemical to the wafers.
Public/Granted literature
- US20150303052A1 PARALLEL MULTI WAFER AXIAL SPIN CLEAN PROCESSING USING SPIN CASSETTE INSIDE MOVABLE PROCESS CHAMBER Public/Granted day:2015-10-22
Information query
IPC分类:
