Invention Grant
- Patent Title: Film formation method and film formation apparatus
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Application No.: US14463735Application Date: 2014-08-20
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Publication No.: US09786494B2Publication Date: 2017-10-10
- Inventor: Yasunori Kumagai , Kohei Tarutani , Takashi Kameoka , Tomoko Yanagita , Ryohei Matsui
- Applicant: Tokyo Electron Limited , L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Applicant Address: JP Tokyo FR Paris
- Assignee: TOKYO ELECTRON LIMITED,L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Current Assignee: TOKYO ELECTRON LIMITED,L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Current Assignee Address: JP Tokyo FR Paris
- Agency: IPUSA, PLLC
- Priority: JP2013-181383 20130902
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
Disclosed is a film formation method, including vaporizing a plurality of raw material monomers in respective corresponding vaporizers, supplying the plurality of raw material monomers into a film formation apparatus, causing vapor deposition polymerization of the plurality of raw material monomers in the film formation apparatus to form an organic film on a substrate, and removing an impurity contained in at least one raw material monomer among the plurality of raw material monomers before the vapor deposition polymerization.
Public/Granted literature
- US20150064931A1 FILM FORMATION METHOD AND FILM FORMATION APPARATUS Public/Granted day:2015-03-05
Information query
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