The present disclosure relates to semiconductor manufacturing, in particular to reticle rack systems. The teachings of the present disclosure may be embodied in a reticle rack unit including a frame with four uprights and multiple crossbars and four turnstiles. The frame may have a longest dimension defining a front side and a back side. The four turnstiles may be mounted to the frame to pivot around a respective rotational axis parallel to the four uprights. Each turnstile may define a plurality of reticle nests sized to hold reticles.