Invention Grant
- Patent Title: Wafer processing method
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Application No.: US14962843Application Date: 2015-12-08
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Publication No.: US09786561B2Publication Date: 2017-10-10
- Inventor: Yohei Yamashita , Kenji Furuta , Yihui Lee
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: JP2014-248325 20141208
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/78 ; H01L21/304 ; H01L21/683 ; H01L23/544

Abstract:
A wafer processing method for dividing a wafer into individual device chips along division lines is disclosed. The wafer processing method includes a back grinding step of grinding the back side of the wafer in the condition where a protective tape is attached to the front side of the wafer, thereby reducing the thickness of the wafer to a predetermined thickness, and a reinforcing insulation seal mounting step of mounting a reinforcing insulation seal capable of transmitting infrared light on the back side of the wafer. The wafer processing method further includes a modified layer forming step of applying a laser beam along each division line to thereby form a modified layer inside the wafer along each division line and a wafer dividing step of applying an external force to the wafer to thereby divide the wafer into the individual device chips along each division line.
Public/Granted literature
- US20160163597A1 WAFER PROCESSING METHOD Public/Granted day:2016-06-09
Information query
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