Invention Grant
- Patent Title: Fuse formed from III-V aspect ratio structure
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Application No.: US15065297Application Date: 2016-03-09
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Publication No.: US09786596B2Publication Date: 2017-10-10
- Inventor: Praneet Adusumilli , Alexander Reznicek , Oscar van der Straten , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Louis J. Percello, Esq.
- Main IPC: H01L23/525
- IPC: H01L23/525 ; H01L29/20 ; H01L21/308 ; H01L21/3213

Abstract:
A fuse structure is provided above a first portion of a semiconductor material. The fuse structure includes a first end region containing a first portion of a metal structure having a first thickness, a second end region containing a second portion of the metal structure having the first thickness, and a neck region located between the first and second end regions. The neck region contains a third portion of the metal structure having a second thickness that is less than the first thickness, wherein a portion of the neck region is located in a gap positioned between a bottom III-V compound semiconductor material portion and a top III-V compound semiconductor material portion.
Public/Granted literature
- US20170263554A1 FUSE FORMED FROM III-V ASPECT RATIO STRUCTURE Public/Granted day:2017-09-14
Information query
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