Invention Grant
- Patent Title: Semiconductor devices comprising protected side surfaces and related methods
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Application No.: US14325619Application Date: 2014-07-08
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Publication No.: US09786643B2Publication Date: 2017-10-10
- Inventor: Zhaohui Ma , Wei Zhou , Chee Chung So , Soo Loo Ang , Aibin Yu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L25/18 ; H01L25/00 ; H01L21/56 ; H01L23/00 ; H01L23/31 ; H01L23/544 ; H01L21/683 ; H01L21/78

Abstract:
Methods of protecting semiconductor devices may involve forming trenches in streets between stacks of semiconductor dice on regions of a semiconductor wafer. A protective material may be positioned between the die stacks and in the trenches, after which the wafer is thinned from a side opposite the die stacks to expose the protective material in the trenches. Semiconductor devices comprising stacks of dice and corresponding base semiconductor dice comprising wafer regions are separated from one another by cutting through the protective material along the streets and in the trenches. The protective material covers at least sides of each die stack as well as side surfaces of the corresponding base semiconductor die.
Public/Granted literature
- US20160013154A1 SEMICONDUCTOR DEVICES COMPRISING PROTECTED SIDE SURFACES AND RELATED METHODS Public/Granted day:2016-01-14
Information query
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