Invention Grant
- Patent Title: Thin-film photovoltaic device and fabrication method
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Application No.: US14009558Application Date: 2012-04-17
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Publication No.: US09786807B2Publication Date: 2017-10-10
- Inventor: Adrian Chirila , Ayodhya Nath Tiwari , Patrick Bloesch , Shiro Nishiwaki , David Bremaud
- Applicant: Adrian Chirila , Ayodhya Nath Tiwari , Patrick Bloesch , Shiro Nishiwaki , David Bremaud
- Applicant Address: CH Dubendorf CH Dubendorf
- Assignee: EMPA,FLISOM AG
- Current Assignee: EMPA,FLISOM AG
- Current Assignee Address: CH Dubendorf CH Dubendorf
- Agency: Patterson + Sheridan LLP
- Priority: WOPCT/IB2011/000857 20110419
- International Application: PCT/IB2012/051926 WO 20120417
- International Announcement: WO2012/143858 WO 20121026
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L21/02 ; H01L31/0256 ; H01L31/032 ; H01L31/0392

Abstract:
A method to fabricate thin-film photovoltaic devices including a photovoltaic Cu(In,Ga)Se2 or equivalent ABC absorber layer, such as an ABC2 layer, deposited onto a back-contact layer characterized in that the method includes at least five deposition steps, during which the pair of third and fourth steps are sequentially repeatable, in the presence of at least one C element over one or more steps. In the first step at least one B element is deposited, followed in the second by deposition of A and B elements at a deposition rate ratio Ar/Br, in the third at a ratio Ar/Br lower than the previous, in the fourth at a ratio Ar/Br higher than the previous, and in the fifth depositing only B elements to achieve a final ratio A/B of total deposited elements.
Public/Granted literature
- US20140026956A1 THIN-FILM PHOTOVOLTAIC DEVICE AND FABRICATION METHOD Public/Granted day:2014-01-30
Information query
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