Invention Grant
- Patent Title: Method of anodising a surface of a semiconductor device
-
Application No.: US14780047Application Date: 2014-03-24
-
Publication No.: US09786808B2Publication Date: 2017-10-10
- Inventor: Jie Cui , Xi Wang
- Applicant: NEWSOUTH INNOVATIONS PTY LIMITED
- Applicant Address: AU Sydney
- Assignee: NEWSOUTH INNOVATIONS PTY LIMITED
- Current Assignee: NEWSOUTH INNOVATIONS PTY LIMITED
- Current Assignee Address: AU Sydney
- Agency: Ballard Spahr LLP
- Priority: AU2013901031 20130325
- International Application: PCT/AU2014/000307 WO 20140324
- International Announcement: WO2014/153597 WO 20141002
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L31/18 ; H01L31/0216 ; H01L31/0224 ; C25D11/32 ; C25D11/02 ; C25D11/06 ; C25D17/06 ; H01L31/0236 ; C25D11/00

Abstract:
The present disclosure provides a method of anodizing a surface of a semiconductor device comprising a p-n junction. The method comprises exposing a first surface portion of the semiconductor device to an electrolytic solution that is suitable for anodizing the first surface portion when an electrical current is directed through a region at the first surface portion. Further, the method comprises exposing a portion of the semiconductor device to electromagnetic radiation in a manner such that the electromagnetic radiation induces the electrical current and the first surface portion anodizes.
Public/Granted literature
- US20160064592A1 A METHOD OF ANODISING A SURFACE OF A SEMICONDUCTOR DEVICE Public/Granted day:2016-03-03
Information query
IPC分类: