Invention Grant
- Patent Title: 3D MRAM with through silicon vias or through silicon trenches magnetic shielding
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Application No.: US15259032Application Date: 2016-09-07
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Publication No.: US09786839B2Publication Date: 2017-10-10
- Inventor: Bharat Bhushan , Juan Boon Tan , Wanbing Yi , Pak-Chum Danny Shum
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Horizon IP Pte. Ltd.
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/08 ; H01L43/12 ; H01L43/02 ; H01L23/498 ; G11C14/00 ; H01L27/24 ; G11C11/16

Abstract:
Emerging memory chips and methods for forming an emerging memory chip are presented. For example, magnetoresistive random access memory (MRAM) chip magnetic shielding and vertical stacking capabilities processed at the wafer-level are disclosed. The method includes providing a magnetic shield in the through silicon vias and/or through silicon trenches surrounding or adjacent to magnetic tunnel junction (MTJ) array within the MRAM region and also at the front side and back side of the chip. Magnetic shield in the through silicon trenches connects front side and back side magnetic shield. Magnetic shield in the through silicon vias provides vertical stacking, magnetic shielding and electrical connection of the MRAM chips to form 3D IC packages. This magnetic shielding method is applicable for both in-plane and perpendicular MRAM chips. The MTJ array is formed in the MRAM region and in between adjacent inter layer dielectric (ILD) levels of the upper ILD layer in the back end of line (BEOL) of the MRAM chip.
Public/Granted literature
- US20170025601A1 3D MRAM WITH THROUGH SILICON VIAS OR THROUGH SILICON TRENCHES MAGNETIC SHIELDING Public/Granted day:2017-01-26
Information query
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