Invention Grant
- Patent Title: Method of manufacturing silicon carbide single crystal and silicon carbide single crystal substrate
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Application No.: US15017235Application Date: 2016-02-05
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Publication No.: US09799735B2Publication Date: 2017-10-24
- Inventor: Tsubasa Honke , Kyoko Okita , Tomohiro Kawase , Tsutomu Hori
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi, Osaka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2013-139782 20130703
- Main IPC: B32B3/00
- IPC: B32B3/00 ; H01L29/16 ; C30B23/00 ; C30B29/36 ; C30B23/02 ; C30B23/06 ; H01L29/04

Abstract:
Quality of a silicon carbide single crystal is improved. A crucible having first and second sides is prepared. A solid source material for growing silicon carbide with a sublimation method is arranged on the first side. A seed crystal made of silicon carbide is arranged on the second side. The crucible is arranged in a heat insulating container. The heat insulating container has an opening facing the second side. The crucible is heated such that the solid source material sublimes. A temperature on the second side is measured through the opening in the heat insulating container. The opening has a tapered inner surface narrowed toward the outside of the heat insulating container.
Public/Granted literature
- US20160155808A1 METHOD OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE Public/Granted day:2016-06-02
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