Invention Grant
- Patent Title: Liquid immersion doping
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Application No.: US14838433Application Date: 2015-08-28
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Publication No.: US09805931B2Publication Date: 2017-10-31
- Inventor: Frank Sinclair , Jay T. Scheuer , William Davis Lee , Peter L. Kellerman
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Agency: Nields, Lemack & Frame, LLC
- Main IPC: H01L21/223
- IPC: H01L21/223 ; H01L21/268 ; H01L21/225 ; H01L29/66 ; H01L21/228

Abstract:
Methods for processing of a workpiece are disclosed. A fluid that contains a desired dopant is prepared. The workpiece is immersed in this fluid, such that the dopant is able to contact all surfaces of the workpiece. The fluid is then evacuated, leaving behind the dopant on the workpiece. The dopant is then subjected to a thermal treatment to drive the dopant into the surfaces of the workpiece. In certain embodiments, a selective doping process may be performed by applying a mask to certain surfaces prior to immersing the workpiece in the fluid. In certain embodiments, the fluid may be in a super-critical state to maximize the contact between the dopant and the workpiece.
Public/Granted literature
- US20170062221A1 Liquid Immersion Doping Public/Granted day:2017-03-02
Information query
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