Invention Grant
- Patent Title: Method of manufacturing semiconductor device and semiconductor device
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Application No.: US15004998Application Date: 2016-01-24
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Publication No.: US09805937B2Publication Date: 2017-10-31
- Inventor: Tomoya Kashiwazaki
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Tokyo
- Agency: Shapiro, Gabor and Rosenberger, PLLC
- Priority: JP2015-036043 20150226
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/302 ; H01L23/495 ; H01L21/304 ; H01L21/283 ; H01L29/41 ; H01L23/482 ; H01L29/06 ; H01L21/683 ; H01L23/00 ; H01L23/31

Abstract:
Reliability of a semiconductor device is improved. A power device includes: a semiconductor chip; a chip mounting part; a solder material electrically coupling a back surface electrode of the semiconductor chip with an upper surface of the chip mounting part; a plurality of inner lead parts and a plurality of outer lead parts electrically coupled with an electrode pad of the semiconductor chip through wires; and a sealing body for sealing the semiconductor chip and the wires. Further, a recess is formed in a peripheral region of the back surface of the semiconductor chip. The recess has a first surface extending to join the back surface and a second surface extending to join the first surface. Also, a metal film is formed over the first surface and the second surface of the recess.
Public/Granted literature
- US20160254160A1 Method of Manufacturing Semiconductor Device and Semiconductor Device Public/Granted day:2016-09-01
Information query
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