Invention Grant
- Patent Title: Atomic layer deposition apparatus
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Application No.: US14444231Application Date: 2014-07-28
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Publication No.: US09809880B2Publication Date: 2017-11-07
- Inventor: Choel Min Jang , In Kyo Kim , Suk Won Jung , Myung Soo Huh
- Applicant: Samsung Display Co. Ltd.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO. LTD.
- Current Assignee: SAMSUNG DISPLAY CO. LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Cantor Colburn LLP
- Priority: KR10-2014-0031009 20140317
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/44 ; C23C16/455 ; C23C16/54
Abstract:
An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.
Public/Granted literature
- US20150259798A1 ATOMIC LAYER DEPOSITION APPARATUS Public/Granted day:2015-09-17
Information query
IPC分类:
