Invention Grant
- Patent Title: Photosensitive transfer material, pattern formation method, and etching method
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Application No.: US14687491Application Date: 2015-04-15
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Publication No.: US09810984B2Publication Date: 2017-11-07
- Inventor: Hideaki Ito , Shinji Fujimoto , Yasumasa Kawabe
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-237163 20121026
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/30 ; G03F7/40 ; G03F7/09 ; G03F7/16 ; C08F12/22 ; G03F7/11 ; C08F12/24
Abstract:
A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
Public/Granted literature
- US20150219993A1 PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD Public/Granted day:2015-08-06
Information query
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