Various aspects of the disclosed technology relate to techniques of retargeting layout features. A process window simulation on a layout design is performed to generate process window information that comprises predicted print positions of layout features computed under various process conditions. Retargeted print positions for a plurality of edge fragments in the layout design are then determined based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints represented based on the process window information and specification limits for printed layout features. Based on the retargeted print positions, positions of the plurality of edge fragments are adjusted for optical proximity correction.