Invention Grant
- Patent Title: Substrate support with surface feature for reduced reflection and manufacturing techniques for producing same
-
Application No.: US14324557Application Date: 2014-07-07
-
Publication No.: US09814099B2Publication Date: 2017-11-07
- Inventor: Shu-Kwan Lau , Joseph M. Ranish , Paul Brillhart , Mehmet Tugrul Samir
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H05B3/00
- IPC: H05B3/00 ; F27D5/00

Abstract:
Methods and apparatus are provided for reducing the thermal signal noise in process chambers using a non-contact temperature sensing device to measure the temperature of a component in the process chamber. In some embodiments, a susceptor for supporting a substrate in a process chamber includes a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy.
Public/Granted literature
Information query