Invention Grant
- Patent Title: Interconnection substrate
-
Application No.: US14584471Application Date: 2014-12-29
-
Publication No.: US09814131B2Publication Date: 2017-11-07
- Inventor: Yusuke Uemichi
- Applicant: FUJIKURA LTD.
- Applicant Address: JP Koto-ku, Tokyo
- Assignee: FUJIKURA LTD.
- Current Assignee: FUJIKURA LTD.
- Current Assignee Address: JP Koto-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-197388 20120907
- Main IPC: H01B17/16
- IPC: H01B17/16 ; H05K1/02 ; H04L25/02 ; H05K1/11 ; H05K3/40 ; H05K3/44

Abstract:
An interconnection substrate includes: a substrate having a first surface and a second surface opposite the first surface; and a transmission line including two parallel through-hole interconnections that are exposed to the first and second surfaces and are formed inside the substrate. Also, at least one of the two through-hole interconnections includes a narrow portion having a smaller diameter than a diameter of the through-hole interconnection in the first surface and a diameter of the through-hole interconnection in the second surface.
Public/Granted literature
- US20150107888A1 INTERCONNECTION SUBSTRATE Public/Granted day:2015-04-23
Information query