Invention Grant
- Patent Title: Laminate substrates having radial cut metallic planes
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Application No.: US14558864Application Date: 2014-12-03
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Publication No.: US09818682B2Publication Date: 2017-11-14
- Inventor: Edmund Blackshear , Shidong Li
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Law Offices of Ira D. Blecker, P.C.
- Main IPC: B32B3/24
- IPC: B32B3/24 ; B32B5/16 ; B32B7/02 ; B32B15/092 ; B32B27/04 ; B32B27/38 ; B32B37/02 ; H01L23/48 ; H01L23/498 ; B32B3/26 ; B32B38/00 ; B32B37/18 ; H05K1/02 ; H05K1/03 ; H05K3/00 ; H05K13/00 ; H01L21/48 ; B32B15/20 ; B32B27/20 ; B32B3/08 ; B32B3/10

Abstract:
A laminate substrate for receiving a semiconductor chip. Included are laminate layers stacked to form the laminate substrate, each laminate layer includes a core that includes particle-filled epoxy and a metallic layer on the core. At least one laminate layer has a radial cut through the metallic layer, the radial cut extending from a periphery of the at least one laminate layer towards a center of the at least one laminate layer. The radial cut cuts only through the metallic layer and does not cut through the core.
Public/Granted literature
- US20160163611A1 LAMINATE SUBSTRATES HAVING RADIAL CUT METALLIC PLANES Public/Granted day:2016-06-09
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