Invention Grant
- Patent Title: Power semiconductor device including trench gate structures with longitudinal axes tilted to a main crystal direction
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Application No.: US15057669Application Date: 2016-03-01
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Publication No.: US09818818B2Publication Date: 2017-11-14
- Inventor: Roland Rupp , Romain Esteve , Dethard Peters
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Baker Botts L.L.P.
- Priority: DE102015103070 20150303
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/423 ; H01L29/739 ; H01L29/66 ; H01L29/861 ; H01L29/16 ; H01L29/78 ; H01L21/02

Abstract:
A semiconductor device includes a semiconductor body with a first main crystal direction parallel to a horizontal plane. Longitudinal axes of trench gate structures are tilted to the first main crystal direction by a tilt angle of at least 2 degree and at most 30 degree in the horizontal plane. Mesa portions are between neighboring trench gate structures. First sidewall sections of first mesa sidewalls are main crystal planes parallel to the first main crystal direction. Second sidewall sections tilted to the first sidewall sections connect the first sidewall sections.
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