Invention Grant
- Patent Title: Light source system and laser light source
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Application No.: US14351397Application Date: 2012-08-10
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Publication No.: US09819154B2Publication Date: 2017-11-14
- Inventor: Fei Hu , Jiayi Yang
- Applicant: Fei Hu , Jiayi Yang
- Applicant Address: CN Shenzhen
- Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee: APPOTRONICS CORPORATION LIMITED
- Current Assignee Address: CN Shenzhen
- Agency: Chen Yoshimura LLP
- Priority: CN201110306719 20111011
- International Application: PCT/CN2012/079978 WO 20120810
- International Announcement: WO2013/053264 WO 20130418
- Main IPC: G02B27/20
- IPC: G02B27/20 ; H01S5/40 ; F21Y113/00 ; F21Y115/30 ; F21Y115/10

Abstract:
A light source system and a laser light source (300). The laser light source includes two groups of laser groups (20a, 20b), wherein at least one group of laser groups includes at least two lasers (21a, 21b, 21c, 21d), and the light beams (L1) generated by the two groups of laser groups are in the same direction and parallel to each other. The first projections of the two groups of laser groups on the cross section of the light beams formed by the respective emergent light rays thereof are partially overlapped with the second projections in a first direction, which first direction is the connection direction of at least two laser centers of a group of laser groups.
Public/Granted literature
- US20140240977A1 LIGHT SOURCE SYSTEM AND LASER LIGHT SOURCE Public/Granted day:2014-08-28
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